Tris(cyclopentadienyl)lanthanum (99.9%-La) (REO) | 57-3000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)neodymium, 99% (99.9%-Nd) (REO) | 60-5000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)samarium (99.9%-Sm) (REO) | 62-3500 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)thulium (99.9%-Tm) (REO) | 69-6000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)ytterbium (99.9%-Yb) (REO) | 70-0075 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)yttrium (99.9%-Y) (REO) | 39-5000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(dimethylamino)antimony (99.99%-Sb) PURATREM | 51-5000 | Thin Film Deposition | Ver → |
Tris(dimethylamino)arsine, 99% | 33-5000 | Ligands | Thin Film Deposition | Ver → |
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM | 14-8750 | Thin Film Deposition | Ver → |
Tris(ethylcyclopentadienyl)yttrium, 97% | 39-5055 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)cerium(III) (99.9%-Ce) (REO) | 58-8000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)dysprosium(III) (99.9%-Dy) (REO) | 66-3000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)erbium(III) (99.9%-Er) (REO) | 68-7200 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)gadolinium(III), 98% (99.9%-Gd) (REO) | 64-6000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)lanthanum (99.9%-La) (REO) | 57-4000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)neodymium (99.9%-Nd) (REO) | 60-6000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)praseodymium (99.9%-Pr) (REO) | 59-8000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(i-propylcyclopentadienyl)terbium (99.9%-Tb) (REO) | 65-7000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(methylcyclopentadienyl)erbium(III) (99.9%-Er) (REO) | 68-8740 | Thin Film Deposition | Other Reagents | Ver → |
Tris(methylcyclopentadienyl)yttrium (99.9%-Y) (REO) | 39-5050 | Thin Film Deposition | Other Reagents | Ver → |
Tris(n-butylcyclopentadienyl)erbium(III) (99.9%-Er) (REO) | 68-7000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III), min. 98% (99.9%-La) (REO) | 57-0510 | Catalysts | Thin Film Deposition | Ver → |
Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), min. 98% (99.9%-Y) (REO) | 39-1500 | Catalysts | Thin Film Deposition | Ver → |
Tris(n-propylcyclopentadienyl)yttrium (99.9%-Y) (REO) | 39-5100 | Thin Film Deposition | Other Reagents | Ver → |
Tris(tetramethylcyclopentadienyl)gadolinium(III), min. 98% | 64-4500 | Thin Film Deposition | Other Reagents | Ver → |
Tris(tetramethylcyclopentadienyl)neodymium (99.9%-Nd) (REO) | 60-7500 | Other Reagents | Ver → |
Tris(trimethylsilyl)methane, min. 97% | 14-9000 | Tris(trimethylsilyl)methane, min. 97% | Ver → |
Tungsten carbonyl, 99% (<0.3%-Mo) | 74-2200 | Thin Film Deposition | Other Reagents | Ver → |
Vanadium(III) acetylacetonate, 98% | 23-2250 | Catalysts | Thin Film Deposition | Ver → |
Vanadium(IV) bis(acetylacetonato)oxide, 98% (Vanadyl acetylacetonate) | 23-2202 | Catalysts | Thin Film Deposition | Ver → |
Vinylferrocene, 99% | 26-3950 | Vinylferrocene, 99% | Ver → |
Vinyltriethylsilane(hexafluoroacetylacetonato)silver(I) (99.9%-Ag) | 47-8000 | Thin Film Deposition | Ver → |
Ytterbium(III) acetylacetonate hydrate (99.9%-Yb) (REO) | 70-2202 | Thin Film Deposition | Ver → |
Ytterbium(III) hexafluoroacetylacetonate dihydrate (99.9%-Yb) (REO) | 70-2500 | Thin Film Deposition | Ver → |
Yttrium(III) acetylacetonate hydrate (99.9%-Y) (REO) | 93-3901 | Thin Film Deposition | Ver → |
Yttrium(III) hexafluoroacetylacetonate, hydrate (99.9%-Y) (REO) | 39-2500 | Thin Film Deposition | Ver → |
Zinc acetylacetonate hydrate, 98% | 93-3031 | Thin Film Deposition | Ver → |
Zinc hexafluoroacetylacetonate hydrate, min. 98% | 93-3035 | Zinc hexafluoroacetylacetonate hydrate, min. 98% | Ver → |
Zirconium(IV) acetylacetonate, min. 97% | 93-4005 | Zirconium(IV) acetylacetonate, min. 97% | Ver → |
Zirconium(IV) ethoxide, 99+% | 93-4043 | Thin Film Deposition | Other Reagents | Ver → |
Zirconium(IV) hexafluoroacetylacetonate | 40-3000 | Thin Film Deposition | Ver → |
Zirconium(IV) n-butoxide (76-80% in n-butanol) | 93-4003 | Thin Film Deposition | Other Reagents | Ver → |
Zirconium(IV) t-butoxide, 98% | 40-1749 | Thin Film Deposition | Other Reagents | Ver → |
Zirconium(IV) t-butoxide (99.99%-Zr) PURATREM | 40-1750 | Thin Film Deposition | Other Reagents | Ver → |
Zirconium(IV) trifluoroacetylacetonate, 99% | 93-4026 | Thin Film Deposition | Ver → |
1 Bromo-2-iodobenzene, min. 98% | 06-0017 | New Products | Other Reagents | Ver → |
11,12-Bis[1,3-dihydro-3-(i-propyl)-2H-benzimidazol-2-ylidene-3-methylene]-9,10-dihydro-9,10-ethanoanthracene | 07-0088 | Ligands | Ver → |
11,12-Bis[N-(2,2-diphenyl-1-ethyl)-1H-benzimidazolium-3-methylene]-9,10-dihydro-9,10-ethanoanthracene bis(trifluoromethanesulfonate), min. 95% | 07-0078 | Ligands | Ver → |
11,12-Bis[N-(2-methylbenzyl)-1H-benzimidazolium-3-methylene]-9,10-dihydro-9,10-ethanoanthracene bis(trifluoromethanesulfonate), min. 95% | 07-0082 | Ligands | Ver → |
11,12-Bis[N-benzyl-1H-imidazolium-3-methylene]-9,10-dihydro-9,10-ethanoanthracene bis(trifluoromethanesulfonate) | 07-0076 | Ligands | Ver → |