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Strem Chemicals
6,537 productos · busca por nombre, modelo o número de parte
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Swagelok® Cylinder Assembly, 50ml with 1/4 VCR Male Bellows-Sealed Valve (High Temp) and Female Nut for CVD/ALD
96-1071
Thin Film Deposition
Ver →
Swagelok® Cylinder Assembly, 50ml with 1/4 VCR Male DP high pressure Valve (High Purity), PCTFE seat, VCR Metal Gasket Seal Fitting, Round Handle, electropolished for CVD/ALD
96-1078
Thin Film Deposition
Ver →
Swagelok® Cylinder Assembly, 50ml with 1/4'' VCR Male DP Valve (Ultra High Purity) and Female Nut, electropolished for CVD/ALD
96-1077
Thin Film Deposition
Ver →
(t-Butylimido)tris(diethylamino)niobium(V), min. 98% TBTDEN, 41-0450, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4071
New Products | Thin Film Deposition
Ver →
(t-Butylimido)tris(diethylamino)niobium(V), min. 98% TBTDEN, 41-0450, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4075
New Products | Thin Film Deposition
Ver →
t-Butylimidotris(dimethylamino)tantalum(V), min. 98%, 73-0700, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4045
Thin Film Deposition
Ver →
Tetrakis(diethylamino)titanium(IV), 99%, 22-1050, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4043
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)germanium(IV), 99+%, 32-0001, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4061
New Products | Thin Film Deposition
Ver →
Tetrakis(dimethylamino)germanium(IV), 99+%, 32-0001, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4062
New Products | Thin Film Deposition
Ver →
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4021
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4022
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM, 50-1815, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4050
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, 93-2240, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4015
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT, 93-2240, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4016
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM, 22-2240, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4072
New Products | Thin Film Deposition
Ver →
Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM, 22-2240, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4076
New Products | Thin Film Deposition
Ver →
Tetrakis(dimethylamino)zirconium(IV), 98% (99.99%-Zr) TDMAZ, 40-4115, contained in 50ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4042
Thin Film Deposition
Ver →
Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ, 40-4100, contained in 50 ml Swagelok® cylinder for (96-1070) CVD/ALD
98-4012
Thin Film Deposition
Ver →
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) TEMAH, PURATREM, 72-7720, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4048
Thin Film Deposition
Ver →
Tetrakis(ethylmethylamino)zirconium(IV) 99% TEMAZ, 40-1710, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4039
Thin Film Deposition
Ver →
Titanium(II) oxide, optical grade, pellets (99.9+%-Ti)
93-2212
Titanium(II) oxide, optical grade, pellets (99.9+%-Ti)
Ver →
Titanium(IV) chloride, 99%, 22-1150, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4033
Thin Film Deposition
Ver →
Titanium(IV) i-propoxide, min. 98%, 93-2216, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4030
Catalysts | Thin Film Deposition | Other Reagents
Ver →
Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD
98-4007
Thin Film Deposition
Ver →
Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4008
Thin Film Deposition
Ver →
Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4011
New Products | Thin Film Deposition
Ver →
Trimethylaluminum, min. 98%, 93-1360, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4003
Thin Film Deposition
Ver →
Trimethylaluminum, min. 98%, 93-1360, contained in high-temp 50 ml Swagelok® cylinder (96-1071) for CVD/ALD
98-4004
Thin Film Deposition
Ver →
Trimethylgallium, 99+%, 31-2000, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4068
Thin Film Deposition
Ver →
Trimethylgallium, elec. gr. (99.9999%-Ga) PURATREM, 98-2000, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD
98-4047
Thin Film Deposition
Ver →
Trimethylindium, elec. gr. (99.999%-In) PURATREM, 98-2010, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD
98-4056
Thin Film Deposition
Ver →
(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4024
Thin Film Deposition | Other Reagents
Ver →
(Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok® cylinder high temperature valve (96-1071) for CVD/ALD
98-4026
Thin Film Deposition | Other Reagents
Ver →
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4035
Thin Film Deposition
Ver →
Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), min. 98% (99.9%-Y) (REO), 39-1500, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-4018
Catalysts | Thin Film Deposition
Ver →
Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 ml Swagelok® cylinder (96-1077) for CVD/ALD
98-6025
Thin Film Deposition | Other Reagents
Ver →
Water, 99.999% (PURATREM), 98-0295, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD
98-8000
Thin Film Deposition
Ver →
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