 Tetrakis(diethylamino)hafnium, 99% (99.99+%-Hf, <0.2% Zr) PURATREM | 72-7750 | Thin Film Deposition | Ver → |
 Tetrakis(diethylamino)titanium(IV), 99% | 22-1050 | Thin Film Deposition | Ver → |
 Tetrakis(diethylamino)vanadium(IV), min. 95% TDEAV | 23-0515 | Thin Film Deposition | Ver → |
 Tetrakis(diethylamino)zirconium, 99% | 93-4040 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)diboron, min. 97% | 05-1035 | Tetrakis(dimethylamino)diboron, min. 97% | Ver → |
 Tetrakis(dimethylamino)germanium(IV), 99+% | 32-0001 | New Products | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM | 72-8000 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)tin(IV), 99% (99.99%-Sn) TDMASn PURATREM | 50-1815 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)titanium(IV), 99% TDMAT | 93-2240 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)titanium(IV), 99% TDMAT (99.99%-Ti) PURATREM | 22-2240 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)vanadium(IV), min. 95% TDMAV | 23-0500 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)zirconium(IV), 98% (99.99%-Zr) PURATREM TDMAZ | 40-4115 | Thin Film Deposition | Ver → |
 Tetrakis(dimethylamino)zirconium(IV), 99% TDMAZ | 40-4100 | Thin Film Deposition | Other Reagents | Ver → |
 Tetrakis(trimethylsilyl)silane, 98% TMSS | 14-7000 | Tetrakis(trimethylsilyl)silane, 98% TMSS | Ver → |
 Tetrarhodium dodecacarbonyl, min. 98% | 45-2150 | Other Reagents | Ver → |
 Thallium(I) ethoxide, min. 95% | 93-8105 | Thin Film Deposition | Other Reagents | Ver → |
 Thallium(I) hexafluoroacetylacetonate, 99% (99.9%-Tl) | 81-2500 | Thin Film Deposition | Ver → |
 Thulium(III) acetylacetonate trihydrate (99.9%-Tm) (REO) | 93-6910 | Thin Film Deposition | Ver → |
 Tin(II) acetylacetonate, min. 98% | 50-1977 | Thin Film Deposition | Ver → |
 Tin(II) ethoxide, min. 99% | 50-2200 | Other Reagents | Ver → |
 Tin(IV) t-butoxide (99.99%-Sn) PURATREM | 50-2100 | Thin Film Deposition | Other Reagents | Ver → |
 Titanium (di-i-propoxide)bis(acetylacetonate) (75% in isopropanol) | 93-2203 | Thin Film Deposition | Other Reagents | Ver → |
 Titanium(IV) ethoxide (99.99%-Ti) PURATREM | 22-2209 | Thin Film Deposition | Other Reagents | Ver → |
 Titanium(IV) ethoxide (contains 5-15% isopropanol) | 93-2209 | Other Reagents | Ver → |
 Titanium(IV) n-butoxide, 98+% | 93-2204 | Thin Film Deposition | Other Reagents | Ver → |
 Titanium(IV) oxide bis(acetylacetonate), min. 95% | 93-2225 | Titanium(IV) oxide bis(acetylacetonate), min. 95% | Ver → |
 Titanium(IV) t-butoxide (99.95%-Ti) | 22-1170 | Thin Film Deposition | Other Reagents | Ver → |
 TMB PURE™ (Trimethylborate), 98% | 93-0531 | TMB PURE™ (Trimethylborate), 98% | Ver → |
 trans-N,N'-Dimethyl-1,2-cyclohexanediamine, 98% | 07-0270 | Ligands | Ver → |
 Tributyl(ethyl)phosphonium diethylphosphate, 95% | 15-1330 | Ligands | Other Reagents | Ver → |
 Tricarbonyltris(propionitrile)molybdenum (O), min. 95% | 42-8000 | Tricarbonyltris(propionitrile)molybdenum (O), min. 95% | Ver → |
 Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM | 98-1855 | Thin Film Deposition | Ver → |
 Triethylaluminum, min. 93% | 13-1850 | Thin Film Deposition | Ver → |
 Triethylaluminum paraffin pellet | 13-1905 | Thin Film Deposition | Ver → |
 Triethylammonium {chlorobis(dimethylglyoximato)(4-hydrogenphosphonatepyridinyl) cobaltate(III)} | 27-3015 | Catalysts | Ver → |
 Triethylarsine, 99% | 33-3400 | Ligands | Thin Film Deposition | Ver → |
 Triethylborate, 98.5+% | 93-0530 | Thin Film Deposition | Ver → |
 Triethylchlorosilane, 99% | 93-1463 | Triethylchlorosilane, 99% | Ver → |
 Triethylgallium, elec. gr. (99.9999%-Ga) PURATREM | 98-1862 | Thin Film Deposition | Ver → |
 Triethylgermanium chloride, 98% | 32-2340 | Triethylgermanium chloride, 98% | Ver → |
 Triethyl(octyl)phosphonium chloride (45-55% solution), CYPHOS® IL 541W | 15-7565 | Ligands | Other Reagents | Ver → |
 Triethylphosphate, 99% | 93-1559 | Thin Film Deposition | Ver → |
 Triethylphosphite, 98% | 15-6350 | Triethylphosphite, 98% | Ver → |
 Triethylphosphonium tetrafluoroborate, 99% | 15-6355 | Ligands | Ver → |
 Triethylsilane, 99% | 14-7750 | Triethylsilane, 99% | Ver → |
 Triethylsilyl trifluoromethanesulfonate, 99% | 14-7910 | Triethylsilyl trifluoromethanesulfonate, 99% | Ver → |
 Triethylsilylacetylene, min. 97% | 14-7850 | Triethylsilylacetylene, min. 97% | Ver → |
 Triethyltin bromide, min. 97% | 50-3000 | Triethyltin bromide, min. 97% | Ver → |
 Triethyltin chloride, 98% | 50-3008 | Triethyltin chloride, 98% | Ver → |
 Triethyl(tri-sec-butoxy)dialuminum (contains diethyl(tetra-sec-butoxy)dialuminum and tetraethyl(di-sec-butoxy)dialuminum) | 13-1900 | Thin Film Deposition | Ver → |
