Trifluoromethyltrimethylsilane, min. 97% | 14-7990 | Trifluoromethyltrimethylsilane, min. 97% | Ver → |
Trihexyl(tetradecyl)phosphonium bis(2,4,4-trimethylpentyl)phosphinate, min. 90% CYPHOS® IL 104 | 15-6374 | Ligands | Other Reagents | Ver → |
Trihydridobis(pentamethylcyclopentadienyl)niobium(V) | 41-0510 | Thin Film Deposition | Other Reagents | Ver → |
Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM | 98-1955 | Thin Film Deposition | Ver → |
Trimethylaluminum, min. 98% | 93-1360 | Thin Film Deposition | Ver → |
Trimethylarsine, 99% | 33-3750 | Ligands | Thin Film Deposition | Ver → |
Trimethylarsine, elec. gr. (99.995%-As) PURATREM | 98-1975 | Ligands | Thin Film Deposition | Ver → |
Trimethylchlorosilane, min. 97% | 93-1464 | Trimethylchlorosilane, min. 97% | Ver → |
(Trimethyl)cyclopentadienylplatinum(IV), 99% | 78-1300 | Thin Film Deposition | Other Reagents | Ver → |
Trimethylethoxysilane, min. 97% | 93-1465 | Trimethylethoxysilane, min. 97% | Ver → |
(Trimethyl)ethylcyclopentadienylplatinum(IV) (99.999%-Pt) PURATREM | 78-1375 | Thin Film Deposition | Other Reagents | Ver → |
Trimethylgallium, 99+% | 31-2000 | Thin Film Deposition | Ver → |
Trimethylgallium, elec. gr. (99.9999%-Ga) PURATREM | 98-2000 | Thin Film Deposition | Ver → |
Trimethylgermanium bromide, 98+% | 93-3214 | Trimethylgermanium bromide, 98+% | Ver → |
Trimethylgermanium chloride, min. 98% | 32-2410 | Trimethylgermanium chloride, min. 98% | Ver → |
Trimethylindium, 98+% (99.9+%-In) | 49-2010 | Thin Film Deposition | Ver → |
Trimethylindium, elec. gr. (99.999%-In) PURATREM | 98-2010 | Thin Film Deposition | Ver → |
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% | 78-1350 | Thin Film Deposition | Other Reagents | Ver → |
(Trimethyl)methylcyclopentadienylplatinum(IV), 99% (99.999%-Pt) PURATREM | 98-1350 | Thin Film Deposition | Other Reagents | Ver → |
Trimethyloxonium tetrafluoroborate, min. 95% | 08-2500 | Trimethyloxonium tetrafluoroborate, min. 95% | Ver → |
(Trimethyl)pentamethylcyclopentadienylplatinum(IV), 99% | 78-1358 | Thin Film Deposition | Other Reagents | Ver → |
(Trimethyl)pentamethylcyclopentadienyltitanium(IV), min. 97% | 22-5500 | Thin Film Deposition | Other Reagents | Ver → |
Trimethylphosphate, min. 97% | 93-1561 | Thin Film Deposition | Ver → |
Trimethylphosphite, 97% | 15-6550 | Trimethylphosphite, 97% | Ver → |
Trimethylphosphonium tetrafluoroborate, 99% | 15-6560 | Ligands | Ver → |
Trimethylsilane, 97% | 14-7925 | Thin Film Deposition | Ver → |
Trimethylsilyl perrhenate, 98% (99.999%-Re) PURATREM | 75-4200 | Thin Film Deposition | Ver → |
Trimethylsilyl trifluoromethanesulfonate, min. 97% | 14-8600 | Trimethylsilyl trifluoromethanesulfonate, min. 97% | Ver → |
Trimethylsilylacetylene, min. 97% | 14-8200 | Trimethylsilylacetylene, min. 97% | Ver → |
Trimethylsilylcyclopentadiene, 97% (mixture of isomers) | 14-7950 | Ligands | Other Reagents | Ver → |
Trimethylsilylpentamethylcyclopentadiene | 14-8000 | Ligands | Other Reagents | Ver → |
Trimethyltin bromide, min. 97% | 50-3500 | Trimethyltin bromide, min. 97% | Ver → |
Trimethyltin chloride, min. 98% | 93-5084 | Trimethyltin chloride, min. 98% | Ver → |
Trimethyltin hydroxide, 98% | 93-5085 | Trimethyltin hydroxide, 98% | Ver → |
Tris(1,2,3,4-tetramethyl-2,4-cyclopentadienyl)cerium(III) (99.9%-Ce) (REO) | 58-9000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(2,6-dimethyl-3,5-heptanedionato)iron(III), 98% Fe(dibm)3 | 26-3915 | Thin Film Deposition | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)erbium(III) (99.9%-Er) (REO) [Er(FOD)₃] | 68-8700 | Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)erbium(III) (99.9%-Er) (REO) [Er(FOD)₃] | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)europium(III) hydrate (99.9%-Eu) (REO) [Eu(FOD)₃] | 93-6326 | Thin Film Deposition | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)lanthanum(III), 99% (99.9%-La) (REO) [La(FOD)₃] | 57-3500 | Thin Film Deposition | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)neodymium(III), 99% (99.9%-Nd) (REO) [Nd(FOD)₃] | 60-5500 | Thin Film Deposition | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)praseodymium(III), 99% (99.9%-Pr) (REO) [Pr(FOD)₃] | 93-5920 | Thin Film Deposition | Ver → |
Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)ytterbium(III), 99% (99.9%-Yb) (REO) [Yb(FOD)₃] | 70-0200 | Tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)ytterbium(III), 99% (99.9%-Yb) (REO) [Yb(FOD)₃] | Ver → |
Tris(acetonitrile)cyclopentadienylruthenium(II) hexafluorophosphate, min. 98% | 44-7870 | Catalysts | Other Reagents | Ver → |
Tris(acetonitrile)pentamethylcyclopentadienylrhodium(III) hexafluoroantimonate, min. 98% | 45-2160 | Catalysts | Other Reagents | Ver → |
Tris(acetonitrile)pentamethylcyclopentadienylruthenium(II) hexafluorophosphate, min. 98% | 44-7880 | Catalysts | Other Reagents | Ver → |
Tris(acetonitrile)pentamethylcyclopentadienylruthenium(II) trifluoromethanesulfonate, min. 98% | 44-7890 | Catalysts | Other Reagents | Ver → |
Tris(butylcyclopentadienyl)yttrium (99.9%-Y) (REO) | 39-4950 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)cerium(III) (99.9%-Ce) (REO) | 58-7500 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)erbium(III) (99.9%-Er) (REO) | 68-8000 | Thin Film Deposition | Other Reagents | Ver → |
Tris(cyclopentadienyl)gadolinium(III) (99.9%-Gd) (REO) | 64-4000 | Thin Film Deposition | Other Reagents | Ver → |