Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium dihydrate, min. 98% [Mg(TMHD)₂] | 12-1000 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), min. 98% (99.9%-Ni) [Ni(TMHD)₂] | 28-0088 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)oxotitanium(IV), min. 95% [OTi(TMHD)₂] | 22-0340 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)palladium(II), min. 98% [Pd(TMHD)₂] | 46-0248 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium hydrate [Sr(TMHD)₂] | 38-1000 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium tetraglyme adduct (99.99%-Sr) PURATREM | 38-1010 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium triglyme adduct (99.99%-Sr) PURATREM | 38-1015 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)zinc, 99% [Zn(TMHD)₂] | 30-0500 | Thin Film Deposition | Ver → |
Bis[2-(4-methyldiphenylphosphino)phenyl]methane, 90% | 15-0358 | Ligands | Ver → |
Bis[2-(di-1-adamantylphosphino)ethyl]amine, min. 97% | 15-7312 | Ligands | Ver → |
Bis{[2-(Diadamantylphosphino)-3-methoxy-2’,4’,6’-tri-i-propyl-3’-(2,3,5,6-tetrafluoro-4-butylphenyl)-1,1’-biphenyl]palladium(0)}1,5-cyclooctadiene, [AlPhos Palladium complex] | 46-0241 | Catalysts | Ver → |
Bis[2-(dicyclohexylphosphino)ethyl]amine, min. 96% | 15-7310 | Ligands | Ver → |
Bis(2-dicyclohexylphosphinophenyl)ether, 98% | 15-0048 | Ligands | Ver → |
Bis[2-(di-i-propylphosphino)-4-methylphenyl]amine, min. 98% | 15-0670 | Ligands | Ver → |
Bis[(2-di-i-propylphosphino)ethyl]amine, min. 97% (10 wt% in tetrahydrofuran) | 15-7304 | Ligands | Ver → |
[Bis(2-diphenylphosphino)ethyl]ether, min. 98% | 15-0383 | Ligands | Ver → |
Bis(2-diphenylphosphinophenyl)ether, 97% DPEphos | 15-0380 | Ligands | Ver → |
Bis[2-(di-t-butylphosphino)ethyl]amine, min. 97% (10wt% in hexanes) | 15-7309 | Ligands | Ver → |
Bis(2-methylallyl)(1,5-cyclooctadiene)ruthenium(II), min. 97% | 44-0046 | Thin Film Deposition | Ver → |
Bis[3,5-difluoro-2-(2-pyridinyl-κN)phenyl-κC](2,2,6,6-tetramethyl-3,5-heptanedionato-κO,κO')iridium(III), min. 98% | 77-8030 | Catalysts | Ver → |
Bis[4,4,4-trifluoro-1-(2-thienyl-1,3-butanedionato]zinc TMEDA adduct, 99% | 30-3055 | Thin Film Deposition | Ver → |
Bis(acetonitrile)(1,5-cyclooctadiene)iridium(I) tetrafluoroborate, min. 97% | 77-0213 | Bis(acetonitrile)(1,5-cyclooctadiene)iridium(I) tetrafluoroborate, min. 97% | Ver → |
Bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate, min. 97% | 45-0115 | Bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate, min. 97% | Ver → |
Bis(acetonitrile)palladium(II) p-toluenesulfonate, 98% | 46-0700 | Catalysts | Ver → |
Bis(benzene)chromium, min. 97% | 24-0130 | Thin Film Deposition | Other Reagents | Ver → |
Bis(dibenzylideneacetone)palladium(0) [Pd(dba)2] | 46-0210 | Catalysts | Ver → |
Bis(dichlorophosphino)methane, min. 90% | 15-0081 | Ligands | Ver → |
Bis(dichlorophosphino)methylamine, min. 97% | 15-0116 | Ligands | Ver → |
Bis(dicyclohexylphosphino)methane, min. 97% | 15-9590 | Ligands | Ver → |
Bis(diphenylphosphino)acetylene, 97% | 15-0100 | Ligands | Ver → |
Bis(diphenylphosphino)methane, 97% | 15-0400 | Ligands | Ver → |
Bis(ethylbenzene)chromium [mixture of (C₂H₅)×C₆H₆η× where x = 0-4)] | 24-0145 | Thin Film Deposition | Ver → |
Bis(ethylbenzene)molybdenum [mixture (C₂H₅)xC₆H(₆-x) where x = 0-4] | 42-0200 | Thin Film Deposition | Ver → |
Bis(ethylmethylamino)silane, 99%, BEMAS (99.999%-Si) PURATREM | 14-1550 | Thin Film Deposition | Other Reagents | Ver → |
Bis(hexyleneglycolato)diboron, 97% | 05-0020 | Other Reagents | Ver → |
Bismuth (III) 2-ethylhexanoate mineral spirits (approx. 28% Bi) | 83-2400 | Bismuth (III) 2-ethylhexanoate mineral spirits (approx. 28% Bi) | Ver → |
Bismuth (III) neodecanoate (99.9 %-Bi), ~60% in neodecanoic acid (15-20% Bi) | 83-7010 | Catalysts | Ver → |
Bismuth(III) 2-ethylhexanoate, 70-75% in xylenes (~24% Bi) (99.99+%-Bi) PURATREM | 83-2401 | Bismuth(III) 2-ethylhexanoate, 70-75% in xylenes (~24% Bi) (99.99+%-Bi) PURATREM | Ver → |
Bismuth(III) acetate, 99% | 93-8352 | Bismuth(III) acetate, 99% | Ver → |
Bismuth(III) neodecanoate, superconductor grade ~60% in neodecanoic acid (15-20% Bi) | 83-7000 | Catalysts | Ver → |
Bismuth(III) telluride (99.99%-Bi) PURATREM | 83-4075 | Bismuth(III) telluride (99.99%-Bi) PURATREM | Ver → |
Bismuth(III) titanate, 98% | 93-8312 | Bismuth(III) titanate, 98% | Ver → |
Bismuth(III) trifluoromethanesulfonate, min. 98% (Bismuth triflate) | 83-8000 | Other Reagents | Ver → |
Bis(neopentylglycolato)diboron, min. 97% | 05-0025 | Other Reagents | Ver → |
Bis(N,N'-di-i-propylacetamidinato)cobalt(II), min. 98% (99.99%-Co) PURATREM Co(iPr-MeAMD)₂ | 27-0486 | Thin Film Deposition | Ver → |
Bis(N,N'-di-i-propylacetamidinato)cobalt(II), min. 98% Co(iPr-MeAMD)2 | 27-0485 | Thin Film Deposition | Ver → |
Bis(N,N'-di-i-propylacetamidinato)tin(II), 99% | 50-1170 | Thin Film Deposition | Ver → |
Bis(N,N’-di-i-propylformamidinato)calcium(II) dimer, (99.99 %-Ca) PURATREM | 20-8200 | Thin Film Deposition | Ver → |
Bis(N,N'-di-i-propylformamidinato)strontium dimer, Sr-FMD | 38-1250 | Thin Film Deposition | Ver → |
Bis(N,N'-di-i-propylpentylamidinato)manganese(II), min. 98% | 25-0230 | Thin Film Deposition | Ver → |