Ammonium tetrafluoroborate, 99% | 93-0501 | Ammonium tetrafluoroborate, 99% | Ver → |
Ammonium tetrathiomolybdate(VI), 99% (99.99%-Mo) PURATREM | 42-1000 | Ammonium tetrathiomolybdate(VI), 99% (99.99%-Mo) PURATREM | Ver → |
Ammonium tetrathiotungstate(VI), 99% (99.9+%-W) | 74-1000 | Ammonium tetrathiotungstate(VI), 99% (99.9+%-W) | Ver → |
Antimony bar (99.999+%) | 51-0050 | Antimony bar (99.999+%) | Ver → |
Antimony(III) acetate, 97% | 93-5111 | Antimony(III) acetate, 97% | Ver → |
Antimony(III) telluride (99.96%-Sb) | 51-1430 | Antimony(III) telluride (99.96%-Sb) | Ver → |
AntPhos and WingPhos Kit | 96-3810 | Ligands | Ver → |
Arsenic(III) selenide (99.999%-As) PURATREM | 93-3305 | Arsenic(III) selenide (99.999%-As) PURATREM | Ver → |
Barium 2-ethylhexanoate, ~30% in xylene (7-10% Ba) | 93-5626 | Barium 2-ethylhexanoate, ~30% in xylene (7-10% Ba) | Ver → |
Barium acetate, 99% (ACS) | 93-5601 | Barium acetate, 99% (ACS) | Ver → |
Barium manganate, 90% | 56-7075 | Barium manganate, 90% | Ver → |
Barium neodecanoate, superconductor grade (25-29% Ba) | 56-7000 | Barium neodecanoate, superconductor grade (25-29% Ba) | Ver → |
Barium nitride (99.7%-Ba) | 56-7510 | Barium nitride (99.7%-Ba) | Ver → |
Barium perchlorate trihydrate (99.9%-Ba) | 93-5650 | Barium perchlorate trihydrate (99.9%-Ba) | Ver → |
Barium stearate, tech. gr. | 93-5644 | Barium stearate, tech. gr. | Ver → |
Barium tetracyanoplatinate(II) tetrahydrate, 99% | 78-0083 | Barium tetracyanoplatinate(II) tetrahydrate, 99% | Ver → |
Barium titanate, 99% | 93-5640 | Barium titanate, 99% | Ver → |
Barium titanate, sintered lump (99.9%-Ba) | 93-5639 | Barium titanate, sintered lump (99.9%-Ba) | Ver → |
Barium trifluoromethanesulfonate, 99% (Barium triflate) | 56-8100 | Other Reagents | Ver → |
Barium trifluoromethanesulfonimide, min. 97% | 56-8120 | Barium trifluoromethanesulfonimide, min. 97% | Ver → |
BASF Metals Scavenging Agent Kit (MSA Kit) | 96-6700 | Other Reagents | Ver → |
Benzhydroxamic acid, min. 99% | 07-0047 | New Products | Ver → |
Benzo-15-crown-5, 97% | 08-0150 | Ligands | Ver → |
Benzoic hydrazide, min. 98% | 07-0071 | New Products | Other Reagents | Ver → |
Benzyl 2-ethynylpiperidine-1-carboxylate, 95% | 06-0193 | New Products | Other Reagents | Ver → |
Benzyl 3-ethynylazetidine-1-carboxylate, 95% | 06-0191 | New Products | Other Reagents | Ver → |
Benzyl (4-ethynylbicyclo[2.2.2]octan-1-yl)carbamate, 95% | 06-0195 | New Products | Other Reagents | Ver → |
Benzyl hept-6-ynoate, 95% | 06-0192 | New Products | Other Reagents | Ver → |
Bimatoprost amide (0.10% wt/v in ETHANOL), min. 98% | 06-6007 | New Products | Other Reagents | Ver → |
Bimatoprost Isopropyl Ester (0.10% wt/v in ETHANOL), min. 98% | 06-6009 | New Products | Other Reagents | Ver → |
Bimatoprost, min. 98% | 06-6008 | New Products | Other Reagents | Ver → |
Bis(1,1,1-trifluoro-2,4-pentanedionato)(1,5-cyclooctadiene)ruthenium(II), 98% | 44-8165 | Thin Film Deposition | Ver → |
Bis[1,2-bis(diphenylphosphino)ethane]palladium(0), 98% | 46-0200 | Bis[1,2-bis(diphenylphosphino)ethane]palladium(0), 98% | Ver → |
Bis{1,3-bis[2,6-bis(1-methylethyl)phenyl]-1,3-dihydro-2H-imidazol-2-ylidene}-μ-hydroxydigold(I) tetrafluoroborate, 99% | 79-0125 | Catalysts | Ver → |
Bis(1,4-di-t-butyl-1,3-diazabutadienyl)cobalt(II) Co(DAD)₂, min. 98% (99.999%-Co) PURATREM | 27-1025 | Thin Film Deposition | Ver → |
Bis(1,4-di-t-butyl-1,3-diazabutadienyl)nickel(II) Ni(DAD)2, min. 98% (99.999%-Ni) PURATREM | 28-0225 | Thin Film Deposition | Ver → |
Bis(1,5-cyclooctadiene)iridium(I) tetrafluoroborate, 95% | 77-0200 | Bis(1,5-cyclooctadiene)iridium(I) tetrafluoroborate, 95% | Ver → |
Bis(1,5-cyclooctadiene)iridium(I) tetrakis[3,5-bis(trifluoromethyl)phenyl]borate, 98% | 77-0225 | Bis(1,5-cyclooctadiene)iridium(I) tetrakis[3,5-bis(trifluoromethyl)phenyl]borate, 98% | Ver → |
Bis(1,5-cyclooctadiene)nickel (0), 98+% | 28-0010 | Catalysts | Ver → |
Bis(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate, 98+% | 45-0109 | Catalysts | Ver → |
Bis(1,5-cyclooctadiene)rhodium(I) trifluoromethanesulfonate, 99% | 45-0110 | Bis(1,5-cyclooctadiene)rhodium(I) trifluoromethanesulfonate, 99% | Ver → |
Bis(1,1,1,5,5,5-hexafluoroacetylacetonato)(N,N,N',N'-tetramethylethylenediamine)iron(II), min. 98% | 26-1640 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), 99% (99.9%-Ru) | 44-0060 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate [Ba(TMHD)₂] | 56-8500 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium tetraglyme adduct (99.99%-Ba, Sr-0.5%) PURATREM | 56-8600 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium triglyme adduct(99.99%-Ba, Sr-0.5%) PURATREM | 56-8610 | Catalysts | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium, min. 97% [Ca(TMHD)₂] | 20-1000 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% [Cu(TMHD)₂] | 29-3000 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II), 99% [Pb(TMHD)₂] | 82-2100 | Thin Film Deposition | Ver → |
Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium, anhydrous, min. 98% [Mg(TMHD)₂] | 12-0900 | Thin Film Deposition | Ver → |