 Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM | 98-8810 | Thin Film Deposition | Ver → |
 Bis(dimethylamino-2-propoxy)copper(II), min. 97% Cu(dmap)₂ | 29-7120 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(dimethylamino)dimethylsilane, 99+% BDMADMS | 14-1530 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(dimethylamino)phosphoryl chloride, 95+% | 15-0087 | Ligands | Ver → |
 Bis(dimethylphosphino)methane, min. 98% | 15-0093 | Ligands | Ver → |
 Bis(ethylcyclopentadienyl)chromium, min. 98% | 24-0147 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)hafnium dichloride, min. 98% | 72-1250 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)iron, min. 98% | 26-0310 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)magnesium, min. 98% | 12-0510 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)manganese, min. 98% | 25-0210 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)nickel, min. 98% | 28-0083 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) | 44-0040 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)titanium(IV) dichloride, min. 98% | 22-0250 | Other Reagents | Ver → |
 Bis(ethylcyclopentadienyl)zirconium dichloride, min. 97% | 40-1030 | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)hafnium dichloride, min. 98% | 72-2000 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)iron, min. 98% | 26-0450 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)manganese, min. 98% | 25-0245 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)nickel, min. 98% | 28-0086 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)titanium dichloride, min. 98% | 22-0320 | Other Reagents | Ver → |
 Bis(i-propylcyclopentadienyl)zirconium dichloride, 98% | 40-1050 | Other Reagents | Ver → |
 Bis(methylcyclopentadienyl)(methyl)(methoxy)zirconium(IV), 98+% | 40-1028 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(n-butylcyclopentadienyl)zirconium dichloride, min. 98% | 40-0900 | Other Reagents | Ver → |
![Bis(N,N'-dimethylpiperazine)tetra[copper(I) iodide], 98% MOF](https://www.strem.com/cdn-cgi/image/format=auto,onerror=redirect/sfsites/c/cms/delivery/media/MCDADWZSNEBVBRNHYJLQDRYRAQ24?version=1.1&channelId=0apVN00000001NV&oid=00D2E000000pAb6) Bis(N,N'-dimethylpiperazine)tetra[copper(I) iodide], 98% MOF | 29-0550 | Materials Science | Ver → |
 Bis(N,N’-di-t-butylacetamidinato)ruthenium(II) dicarbonyl, 98% (99.99%-Ru) PURATREM | 44-0056 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(n-propylcyclopentadienyl)magnesium, min. 98% | 12-0550 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(n-propyltetramethylcyclopentadienyl)barium, min. 98% | 56-8460 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)barium, 98% | 56-8450 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)chromium, min. 95% (Decamethylchromocene) | 24-0150 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)cobalticinium hexafluorophosphate, 98% | 27-1000 | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)dimethylzirconium(IV), 99% | 40-1054 | Catalysts | Thin Film Deposition | Ver → |
 Bis(pentamethylcyclopentadienyl)hafnium dichloride, min. 98% | 72-1500 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)iron, 99% | 26-0400 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)magnesium, elec. gr. (99.999%-Mg) PURATREM | 97-1045 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)magnesium, min. 98% | 12-1045 | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)manganese, min. 98% (Decamethylmanganocene) | 25-0235 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)nickel, 98% (Decamethylnickelocene) | 28-0085 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)osmium, 99% (99.9%-Os) (Decamethylosmocene) | 76-0200 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)ruthenium, 99% (99.9%-Ru) (Decamethylruthenocene) | 44-0050 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)titanium dichloride, 99% | 22-0300 | Other Reagents | Ver → |
 Bis(pentamethylcyclopentadienyl)zirconium dichloride, 99% | 40-1044 | Other Reagents | Ver → |
 Bis(t-butylcyclopentadienyl)titanium dichloride, min. 98% | 22-0170 | Other Reagents | Ver → |
 Bis(t-butylcyclopentadienyl)zirconium dichloride, min. 98% | 40-0750 | Other Reagents | Ver → |
 Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98% | 42-0215 | Thin Film Deposition | Ver → |
 Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW | 74-1225 | Thin Film Deposition | Ver → |
 Bis(tetramethylcyclopentadienyl)chromium, min. 98% | 24-0154 | Other Reagents | Ver → |
 Bis(tetramethylcyclopentadienyl)manganese, min. 98% | 25-0265 | Other Reagents | Ver → |
 Bis(tetramethylcyclopentadienyl)nickel, min. 98% | 28-0087 | Thin Film Deposition | Other Reagents | Ver → |
 Bis(tetramethylcyclopentadienyl)zirconium dichloride, min. 97% | 40-1060 | Other Reagents | Ver → |
 Bis(tri-isopropylcyclopentadienyl)strontium 98% | 38-1200 | Bis(tri-isopropylcyclopentadienyl)strontium 98% | Ver → |
 Bis(trimethylsilyl)acetylene, min. 97% | 14-1000 | Bis(trimethylsilyl)acetylene, min. 97% | Ver → |
