Allyl(cyclopentadienyl)palladium(II), 98% | 46-0065 | Catalysts | Thin Film Deposition | Ver → |
Allylruthenium(II) tricarbonyl bromide, 98% | 44-5150 | Catalysts | Thin Film Deposition | Other Reagents | Ver → |
Aluminum acetylacetonate, 98% | 93-1302 | Thin Film Deposition | Ver → |
Aluminum ethoxide, 99% | 93-1370 | Thin Film Deposition | Other Reagents | Ver → |
Aluminum hexafluoroacetylacetonate, min. 98% | 13-0200 | Thin Film Deposition | Ver → |
Aluminum s-butoxide, 98% | 93-1308 | Thin Film Deposition | Other Reagents | Ver → |
Antimony(III) ethoxide, 99% | 93-5115 | Thin Film Deposition | Other Reagents | Ver → |
Antimony(III) n-butoxide, 99% | 93-5113 | Thin Film Deposition | Other Reagents | Ver → |
Barium acetylacetonate hydrate | 93-5657 | Thin Film Deposition | Ver → |
Barium bis(N,N,N',N',N''-pentamethyldiethylenetriamine)bis[BREW] (99.99+%-Ba) PURATREM | 56-5656 | Thin Film Deposition | Ver → |
Benzene chromium tricarbonyl, 98% | 24-0120 | Benzene chromium tricarbonyl, 98% | Ver → |
Beryllium(II) acetylacetonate min. 97% | 04-4000 | Thin Film Deposition | Ver → |
Bis(μ-dimethylamino)tetrakis(dimethylamino)digallium, 98% | 31-2030 | Thin Film Deposition | Ver → |
Bis{[μ-[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98% | 27-0515 | Bis{[μ-[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98% | Ver → |
Bis(1-(2,6-diethylphenyl)-3,5,5-trimethyl-3-phenylpyrrolidin-2-ylidene)(3-phenyl-1H-inden-1-ylidene)ruthenium(II) dichloride UltraCat | 44-0775 | Catalysts | Ver → |
Bis{[1-(2R,5R)-2,5-diethylphospholanyl]-[2-(2R,5R)-2,5-diethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97% | 29-3007 | Catalysts | Ver → |
Bis{[1-(2R,5R)-2,5-dimethylphospholanyl]-[2-(2R,5R)-2,5-dimethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97% | 29-3002 | Catalysts | Ver → |
Bis{[1-(2S,5S)-2,5-diethylphospholanyl]-[2-(2S,5S)-2,5-diethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97% | 29-3008 | Catalysts | Ver → |
Bis{[1-(2S,5S)-2,5-dimethylphospholanyl]-[2-(2S,5S)-2,5-dimethylphospholanyl-1-oxide]benzene}copper(I) trifluoromethanesulfonate, min. 97% | 29-3003 | Catalysts | Ver → |
Bis(1-dimethylamino-2-methyl-2-propanolate)lead(II), 98% Pb(DMAMP)₂ | 82-2155 | Thin Film Deposition | Other Reagents | Ver → |
Bis[1-(N,N-dimethylamino)-2-propanolato]nickel(II), 99% NiDMAP | 28-0025 | Thin Film Deposition | Ver → |
Bis(2,4,4-trimethylpentyl)phosphinic acid, min. 85%, CYTOP® 501 | 15-7555 | Ligands | Other Reagents | Ver → |
Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)barium [Ba(FOD)₂] | 56-8400 | Thin Film Deposition | Ver → |
Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)calcium [Ca(FOD)₂] | 20-8400 | Thin Film Deposition | Ver → |
Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)copper(II) [Cu(FOD)₂] | 29-8400 | Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)copper(II) [Cu(FOD)₂] | Ver → |
Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)strontium hydrate [Sr(FOD)₂] | 38-8400 | Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)strontium hydrate [Sr(FOD)₂] | Ver → |
Bis(acetonitrile)tetracarbonylmolybdenum(0), 98% | 42-9028 | Bis(acetonitrile)tetracarbonylmolybdenum(0), 98% | Ver → |
Bis(acetonitrile)tetracarbonyltungsten(0) | 74-1910 | Bis(acetonitrile)tetracarbonyltungsten(0) | Ver → |
Bis(cyclopentadienyl)chromium, min. 95%, sublimed (Chromocene) | 24-0135 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)cobalt(II), min. 98% (Cobaltocene) | 27-0475 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)dicarbonyl titanium(II), min. 98% | 22-0180 | Catalysts | Other Reagents | Ver → |
Bis(cyclopentadienyl)dimethylhafnium, min. 97% | 72-0700 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)dimethylzirconium, min. 97% | 40-1000 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)hafnium dichloride, min. 98% (Hafnocene dichloride) | 72-1000 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)iron, 98% (Ferrocene) | 26-1699 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)iron, min. 98.5%(Ferrocene) | 26-1700 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)magnesium (99.99+%-Mg) PURATREM | 97-1040 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)magnesium (99.9+%-Mg) | 12-0500 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)manganese, 98+% (Manganocene) | 25-0200 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)molybdenum dichloride, 99% | 42-0100 | Other Reagents | Ver → |
Bis(cyclopentadienyl)nickel, 99% (Nickelocene) | 28-1301 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)osmium, 99% (99.9%-Os) (Osmocene) | 76-0150 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)ruthenium, 99% (99.9%-Ru) (Ruthenocene) | 44-6200 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)titanium dichloride, 99+% (Titanocene dichloride) | 22-0200 | Catalysts | Other Reagents | Ver → |
Bis(cyclopentadienyl)tungsten dichloride, min. 97.5% | 74-1200 | Other Reagents | Ver → |
Bis(cyclopentadienyl)vanadium dichloride (Vanadocene dichloride), 95% | 23-0200 | Other Reagents | Ver → |
Bis(cyclopentadienyl)vanadium, sublimed, 95% (Vanadocene) | 23-0180 | Thin Film Deposition | Other Reagents | Ver → |
Bis(cyclopentadienyl)zirconium chloride hydride (Schwartz's Reagent), 95% | 40-1040 | Catalysts | Other Reagents | Ver → |
Bis(cyclopentadienyl)zirconium dichloride, 99% (Zirconocene dichloride) | 93-4002 | Catalysts | Other Reagents | Ver → |
Bis(diethylamino)silane, 97% BDEAS | 14-7030 | Thin Film Deposition | Other Reagents | Ver → |