Triphenylantimony, 97% | 51-3000 | Triphenylantimony, 97% | Ver → |
Triphenylarsine, min. 97% | 33-4000 | Ligands | Ver → |
Triphenylbismuth, 99% | 93-8350 | Thin Film Deposition | Ver → |
Triphenylborane, ammonia complex, min. 98% | 05-1295 | Triphenylborane, ammonia complex, min. 98% | Ver → |
Triphenylborane, min. 95% | 93-0543 | Triphenylborane, min. 95% | Ver → |
Triphenylchlorosilane, 97% | 93-1466 | Triphenylchlorosilane, 97% | Ver → |
Triphenylphosphite, 97% | 15-6850 | Triphenylphosphite, 97% | Ver → |
Triphenylsilane, min. 97% | 93-1467 | Triphenylsilane, min. 97% | Ver → |
Triphenylsilanol, min. 98% | 93-1468 | Triphenylsilanol, min. 98% | Ver → |
Triphenyltin acetate, 95% | 93-5059 | Triphenyltin acetate, 95% | Ver → |
Tris[(1-benzyl-1H-1,2,3-triazol-4-yl)methyl]amine, 97% TBTA | 07-3215 | Ligands | Ver → |
Tris[2-(2,4-difluorophenyl)pyridine]iridium(III), 95% | 77-7030 | Catalysts | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum, 99% (99.9%-Al) [Al(TMHD)₃] | 13-5000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), min. 98% (99.9%-Bi) [Bi(TMHD)₃] | 83-1000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)chromium(III), 99% [Cr(TMHD)₃] | 24-1500 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt(III), 99% (99.9+%-Co) [Co(TMHD)₃] | 27-3000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)dysprosium(III), 98+% (99.9%-Dy) (REO) [Dy(TMHD)₃] | 66-8500 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium(III), 99% (99.9%-Er) (REO) [Er(TMHD)₃] | 68-8750 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium(III), 99% (99.9%-Eu) (REO) [Eu(TMHD)₃] | 93-6328 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium(III), 99% (99.9%-Gd) (REO) [Gd(TMHD)₃] | 64-5000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gallium(III), 99% (99.999%-Ga) [Ga(TMHD)₃] PURATREM | 31-5000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium(III), 99% (99.9%-Ho) (REO) [Ho(TMHD)₃] | 67-5000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III), 99% (99.9%-In) [In(TMHD)₃] | 49-2200 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III), 99% (99.9%-Fe) [Fe(TMHD)₃] | 26-3910 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99% (99.9%-La) (REO) [La(TMHD)₃] | 57-1000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III) tetraglyme adduct (99.9%-La) (REO) | 57-1100 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lutetium(III), 99% (99.9+%-Lu) (REO) [Lu(TMHD)₃] | 71-1080 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)₃] | 25-5000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)neodymium(III), 99% (99.9%-Nd) (REO) [Nd(TMHD)₃] | 60-8750 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III), 99% (99.9%-Pr) (REO) [Pr(TMHD)₃] | 93-5937 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 99% (99.9%-Ru) [Ru(TMHD)₃] | 44-8000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)samarium(III) (99.9%-Sm) (REO) [Sm(TMHD)₃] | 62-4000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)scandium(III), 99% (99.9%-Sc) (REO) [Sc(TMHD)₃] | 21-1000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)terbium(III), 99% (99.9%-Tb) (REO) [Tb(TMHD)₃] | 65-8000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)thulium(III), 98% (99.9%-Tm) (REO) [Tm(TMHD)₃] | 69-7000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(III), min. 97% [Ti(TMHD)₃] | 22-6000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ytterbium(III), 99% (99.9%-Yb) (REO) [Yb(TMHD)₃] | 70-0100 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III), 98+% (99.9%-Y) (REO) [Y(TMHD)₃] | 39-1000 | Thin Film Deposition | Ver → |
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III) triglyme adduct (99.9%-Y) (REO) | 39-1015 | Thin Film Deposition | Ver → |
Tris[(2-(2-pyridinyl-kN)-5-(trifluoromethyl)phenyl-kC]iridium(III), 95% | 77-6580 | Catalysts | Ver → |
Tris(2,4-di-t-butylphenyl)phosphite, 98% | 15-7720 | Ligands | Ver → |
Tris(2-phenylpyridinato-C2,N)iridium(III), 95% | 77-7015 | Catalysts | Ver → |
Tris[5-fluoro-2-(2-pyridinyl-kN)phenyl-kC]iridium(III), 95% | 77-6100 | Catalysts | Ver → |
Tris[μ-[2-amino-1,4-benzenedicarboxylato(2-)-κO1:κO'1]]diaquachloro-μ3-oxotri-aluminum MOF, MIL-101(Al)-NH₂ | 13-3060 | Materials Science | Ver → |
Tris[di(4-acetoxybenzylidene)acetone]dipalladium(0) di(4-acetoxybenzylidene)acetone adduct, min. 97% | 46-3005 | Catalysts | Ver → |
Tris(dibenzylideneacetone)dipalladium(0) | 46-3000 | Catalysts | Ver → |
Tris(dibenzylideneacetone)dipalladium(0) chloroform adduct | 46-3010 | Catalysts | Ver → |
Tris(dibenzylideneacetone)dipalladium(0)/tri-t-butylphosphonium tetrafluoroborate admixture (molar Pd/P = 1:1.2) | 46-3015 | Catalysts | Ver → |
Tris(dibenzylideneacetone)dipalladium(0)/tri-t-butylphosphonium tetrafluoroborate admixture (molar Pd/P = 1:2) | 46-3020 | Catalysts | Ver → |
Tris(dibenzylideneacetone)diplatinum(0), min. 98% | 78-1365 | Tris(dibenzylideneacetone)diplatinum(0), min. 98% | Ver → |