Tetraammine palladium(II) tetrachloropalladate(II), 99% | 46-2143 | Tetraammine palladium(II) tetrachloropalladate(II), 99% | Ver → |
Tetraammineplatinum(II) tetrachloroplatinate(II), 99% | 78-2015 | Tetraammineplatinum(II) tetrachloroplatinate(II), 99% | Ver → |
Tetrabenzylhafnium, min. 97% | 72-7700 | Tetrabenzylhafnium, min. 97% | Ver → |
Tetrabenzylzirconium, min. 95% | 40-1650 | Tetrabenzylzirconium, min. 95% | Ver → |
Tetrabutoxysilane, min. 97% | 93-1451 | Thin Film Deposition | Other Reagents | Ver → |
Tetrabutylammonium perchlorate, min. 98% | 07-1969 | Tetrabutylammonium perchlorate, min. 98% | Ver → |
Tetrabutylammonium tetrafluoroborate, 99% | 09-6635 | Other Reagents | Ver → |
Tetrabutylammonium tetrathiorhenate(VII), 99% | 75-1000 | Tetrabutylammonium tetrathiorhenate(VII), 99% | Ver → |
Tetrachlorobis(tetrahydrofuran)titanium(IV), min. 97% | 22-1080 | Tetrachlorobis(tetrahydrofuran)titanium(IV), min. 97% | Ver → |
Tetrachlorobis(tetrahydrofuran)zirconium | 40-1700 | Tetrachlorobis(tetrahydrofuran)zirconium | Ver → |
Tetracyanoethylene, 98% | 07-1975 | Ligands | Ver → |
Tetracyclohexyltin, 99% | 50-1800 | Tetracyclohexyltin, 99% | Ver → |
Tetraethoxysilane, min. 98% TEOS | 93-1454 | Thin Film Deposition | Other Reagents | Ver → |
Tetraethoxysilane, TEOS (99.999%-Si) PURATREM | 14-1454 | Thin Film Deposition | Other Reagents | Ver → |
Tetraethylgermane, 99% | 93-3227 | Thin Film Deposition | Ver → |
Tetrahydroxydiboron, min. 95% | 05-1015 | Other Reagents | Ver → |
Tetra-i-propyltin, min. 98% | 50-1950 | Tetra-i-propyltin, min. 98% | Ver → |
Tetrakis(1,5-cyclooctadiene)tetra-μ-hydridotetrarhodium, min. 98% | 45-2050 | Tetrakis(1,5-cyclooctadiene)tetra-μ-hydridotetrarhodium, min. 98% | Ver → |
Tetrakis[1-(methoxy)-2-methyl-2-propanolato] cerium, [Ce(mmp)4], 98% | 58-5500 | Thin Film Deposition | Ver → |
Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium(IV), min. 97% (99.9%-Ce) (REO) [Ce(TMHD)₄] | 58-5000 | Thin Film Deposition | Ver → |
Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)hafnium(IV), 99% | 72-7580 | Thin Film Deposition | Ver → |
Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)niobium(IV), 99% [Nb(TMHD)₄] | 41-7000 | Thin Film Deposition | Ver → |
Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV), 99% [Zr(TMHD)₄] | 40-5000 | Thin Film Deposition | Ver → |
Tetrakis(acetonitrile)palladium(II) tetrafluoroborate, min. 98% | 46-2145 | Tetrakis(acetonitrile)palladium(II) tetrafluoroborate, min. 98% | Ver → |
Tetrakis(acetoxymercuri)methane, min. 95% | 80-7000 | Tetrakis(acetoxymercuri)methane, min. 95% | Ver → |
Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr) TEMAH PURATREM | 72-7720 | Thin Film Deposition | Ver → |
Tetrakis(ethylmethylamino)silane, 98%, TEMAS | 14-6990 | Thin Film Deposition | Ver → |
Tetrakis(ethylmethylamino)titanium, 99% (99.99%-Ti) PURATREM | 22-1060 | Thin Film Deposition | Ver → |
Tetrakis(ethylmethylamino)vanadium(IV), 97% TEMAV | 23-0365 | Thin Film Deposition | Ver → |
Tetrakis(ethylmethylamino)zirconium(IV), 99% TEMAZ | 40-1710 | Thin Film Deposition | Ver → |
Tetrakis[(R)-(-)-[(1R)-1-(4-bromophenyl)-2,2-diphenylcyclopropanecarboxylato]dirhodium(II) Rh₂(R-BTPCP)₄ | 45-2080 | Catalysts | Ver → |
Tetrakis[(R)-(+)-N-(p-dodecylphenylsulfonyl)prolinato]dirhodium(II) Rh₂(R-DOSP)₄ | 45-2100 | Catalysts | Ver → |
Tetrakis[(S)-(+)-(1-adamantyl)-(N-phthalimido)acetato]dirhodium(II) Rh₂(S-PTAD)₄ | 45-2071 | Catalysts | Ver → |
Tetrakis[(S)-(+)-[(1S)-1-(4-bromophenyl)-2,2-diphenylcyclopropanecarboxylato]dirhodium(II) Rh₂(S-BTPCP)₄ | 45-2081 | Catalysts | Ver → |
Tetrakis[(S)-(-)-N-(p-dodecylphenylsulfonyl)prolinato]dirhodium(II) Rh₂(S-DOSP)₄ | 45-2101 | Catalysts | Ver → |
Tetramethoxysilane, 98% | 93-1459 | Thin Film Deposition | Other Reagents | Ver → |
Tetramethyl 6,6'-bis(diphenylphosphino)-1,1',3,3'-tetrahydro[5,5']biindenyl-2,2',2,2'-tetracarboxylate, 99% | 15-0506 | Ligands | Ver → |
Tetramethylammonium ferricyanide, 97% | 26-3765 | Tetramethylammonium ferricyanide, 97% | Ver → |
Tetramethylammonium tetrafluoroborate, 97% | 09-6938 | Other Reagents | Ver → |
Tetramethylgermane, 99% | 32-2125 | Thin Film Deposition | Ver → |
Tetramethyl(n-propyl)cyclopentadiene, min. 97% | 06-3050 | Ligands | Other Reagents | Ver → |
Tetramethylsilane, 99.9+% (NMR grade) | 93-1458 | Thin Film Deposition | Ver → |
Tetramethyltin, 98% | 50-1900 | Thin Film Deposition | Ver → |
Tetra-n-butylgermane, min. 98% | 32-2050 | Thin Film Deposition | Ver → |
Tetra-n-butyltin, min. 94% | 93-5049 | Tetra-n-butyltin, min. 94% | Ver → |
Tetra-n-propyltin, min. 97% | 93-5053 | Thin Film Deposition | Ver → |
Tetraoxopyridineosmium(VIII) (~7.5% Os) polymer-bound FibreCat™ | 76-2970 | Catalysts | Ver → |
Tetraphenyllead, min. 97% | 82-2150 | Tetraphenyllead, min. 97% | Ver → |
Tetraphenyltin, min. 95% | 93-5052 | Tetraphenyltin, min. 95% | Ver → |
Tetrapropylammonium perruthenate, min. 97% TPAP | 44-7850 | Tetrapropylammonium perruthenate, min. 97% TPAP | Ver → |